TEL 261 — Basic Nanofabrication Process
This course provides an overview of basic processing steps in Nanofabrication (contact lithography, basic etching and deposition techniques). The majority of the course details a step-by-step description of the equipment and processes needed to fabricate devices and structures. Processing flow will be examined for structures such as microelectronic devices including diode and the MOS capacitor. Students receive an in depth introduction to basic lithography from wafer preparation to final inspection. Contamination issues in nanofabrication are discussed in detail. Students will learn the similarities and differences in both equipment and process flows for each configuration by undertaking "hands-on" processing.