TEL 262 — Thin Film in Nanofabrication
This course covers advanced thin film deposition and etching practices in nanofabrication. Advanced deposition techniques covered in the first part of the course include atmosphere, low-pressure and plasma enhanced chemical vapor deposition, sputtering, thermal and electron beam evaporation. The study of materials includes dielectrics, polysilicon and metals. The second part of the course focuses on advanced etching practices and techniques emphasizing reactive ion etching, high-density plasma systems, ion beam etching, and wet chemical etching. Students will receive hands-on experience in depositing and etching dielectric, semiconductor, and metallic materials using state-of-the-art tools and practicing many of the steps critical to nanofabrication of semiconductor devices including microelectronics, MEMs devices, display structures, and structures used in the biotechnology fields.