EL282 — Plasma and Thin Films Deposition
EL 282 - Plasma and Thin Films Deposition EL 282 - Plasma and Thin Films Deposition This course is an introductory study of plasma systems and thin film deposition techniques. The course includes the following topics: states of matter and properties of gases; DC, AC and RF plasma; plasma glow discharge; plasma sources; plasma power measurements; transmission lines fundamentals such as electrical properties of coaxial cables, transmission parameters, coaxial cables as impedance transformers; impedance matching; plasma based thin film deposition techniques. Laboratory experiments focus on spectral emissions from gases, I-V characteristics of NE-2 bulbs, structure of DC glow discharge, velocity of propagation in a coaxial cable, reflection coefficient and standing wave ratio, coaxial cables as impedance transformers, impedance matching, DC sputtering, AC/RF sputtering, and thin film characterization. Course
Prerequisites: EL202, EL203