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NS202 — Basic Nanotechnology Processes

3 credits · 3 hours

NS 202 - Basic Nanotechnology Processes NS 202 - Basic Nanotechnology Processes This course will introduce students to top-down, bottom-up, and hybrid nanofabrication; additive processes and sputtering; plasma, plasma setups, and plasma deposition; subtractive processes and etching; RIE; wet etching; pattern transfer and lithography techniques; typical LPCVD systems for top-down applications; 1D materials in bottom-up applications; and physical vapor deposition. Course

Prerequisites: NS201

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