NS205 — Patterning for Nanotechnology
NS 205 - Patterning for Nanotechnology NS 205 - Patterning for Nanotechnology This course will introduce students to the following topics: basics of photolithography; advanced lithography technologies such as antireflective coating, alignment, and exposure systems, contact aligner, scanning projection aligner, electron beam lithography; photoresists; nanoimprint lithography; UV molding; edge lithography; probe lithography; block copolymer patterning. Course
Prerequisites: NS201